Characterization of doped hydrogenated amorphous carbon films using electron cyclotron resonance chemical vapour deposition (ECR-CVD) technique for electronic applications
This project aims to investigate the characteristics of a-C:H in two aspects, namely, its doping achieved by adding N2 B2H6 and PH3 to the hydrocarbon gas mixture during film growth and to characterize the plasma during the growth process through optical emission spectroscopy (OES) and Langmuir prob...
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2008
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sg-ntu-dr.10356-28002023-03-04T03:21:57Z Characterization of doped hydrogenated amorphous carbon films using electron cyclotron resonance chemical vapour deposition (ECR-CVD) technique for electronic applications Rusli. School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials This project aims to investigate the characteristics of a-C:H in two aspects, namely, its doping achieved by adding N2 B2H6 and PH3 to the hydrocarbon gas mixture during film growth and to characterize the plasma during the growth process through optical emission spectroscopy (OES) and Langmuir probe. RG 10/97 2008-09-17T09:14:58Z 2008-09-17T09:14:58Z 2002 2002 Research Report http://hdl.handle.net/10356/2800 Nanyang Technological University application/pdf |
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DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials Rusli. Characterization of doped hydrogenated amorphous carbon films using electron cyclotron resonance chemical vapour deposition (ECR-CVD) technique for electronic applications |
| description |
This project aims to investigate the characteristics of a-C:H in two aspects, namely, its doping achieved by adding N2 B2H6 and PH3 to the hydrocarbon gas mixture during film growth and to characterize the plasma during the growth process through optical emission spectroscopy (OES) and Langmuir probe. |
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School of Electrical and Electronic Engineering |
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School of Electrical and Electronic Engineering Rusli. |
| format |
Research Report |
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Rusli. |
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Rusli. |
| title |
Characterization of doped hydrogenated amorphous carbon films using electron cyclotron resonance chemical vapour deposition (ECR-CVD) technique for electronic applications |
| title_short |
Characterization of doped hydrogenated amorphous carbon films using electron cyclotron resonance chemical vapour deposition (ECR-CVD) technique for electronic applications |
| title_full |
Characterization of doped hydrogenated amorphous carbon films using electron cyclotron resonance chemical vapour deposition (ECR-CVD) technique for electronic applications |
| title_fullStr |
Characterization of doped hydrogenated amorphous carbon films using electron cyclotron resonance chemical vapour deposition (ECR-CVD) technique for electronic applications |
| title_full_unstemmed |
Characterization of doped hydrogenated amorphous carbon films using electron cyclotron resonance chemical vapour deposition (ECR-CVD) technique for electronic applications |
| title_sort |
characterization of doped hydrogenated amorphous carbon films using electron cyclotron resonance chemical vapour deposition (ecr-cvd) technique for electronic applications |
| publishDate |
2008 |
| url |
http://hdl.handle.net/10356/2800 |
| _version_ |
1759855270450692096 |