Fabrication and characterisation of microelectronics devices, circuits and system II
The quantum well intermixing (QWI) technique using pulsed-photoabsorption-induced disordering (P-PAID) in the InGaAs/InGaAsP material system has been investigated.
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التنسيق: | Research Report |
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2008
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الوصول للمادة أونلاين: | http://hdl.handle.net/10356/2866 |
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sg-ntu-dr.10356-28662023-03-04T03:20:28Z Fabrication and characterisation of microelectronics devices, circuits and system II Zhang, Dao Hua School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Microelectronics The quantum well intermixing (QWI) technique using pulsed-photoabsorption-induced disordering (P-PAID) in the InGaAs/InGaAsP material system has been investigated. RGM 14/99 2008-09-17T09:16:00Z 2008-09-17T09:16:00Z 2003 2003 Research Report http://hdl.handle.net/10356/2866 Nanyang Technological University application/pdf |
institution |
Nanyang Technological University |
building |
NTU Library |
continent |
Asia |
country |
Singapore Singapore |
content_provider |
NTU Library |
collection |
DR-NTU |
topic |
DRNTU::Engineering::Electrical and electronic engineering::Microelectronics |
spellingShingle |
DRNTU::Engineering::Electrical and electronic engineering::Microelectronics Zhang, Dao Hua Fabrication and characterisation of microelectronics devices, circuits and system II |
description |
The quantum well intermixing (QWI) technique using pulsed-photoabsorption-induced disordering (P-PAID) in the InGaAs/InGaAsP material system has been investigated. |
author2 |
School of Electrical and Electronic Engineering |
author_facet |
School of Electrical and Electronic Engineering Zhang, Dao Hua |
format |
Research Report |
author |
Zhang, Dao Hua |
author_sort |
Zhang, Dao Hua |
title |
Fabrication and characterisation of microelectronics devices, circuits and system II |
title_short |
Fabrication and characterisation of microelectronics devices, circuits and system II |
title_full |
Fabrication and characterisation of microelectronics devices, circuits and system II |
title_fullStr |
Fabrication and characterisation of microelectronics devices, circuits and system II |
title_full_unstemmed |
Fabrication and characterisation of microelectronics devices, circuits and system II |
title_sort |
fabrication and characterisation of microelectronics devices, circuits and system ii |
publishDate |
2008 |
url |
http://hdl.handle.net/10356/2866 |
_version_ |
1759854045944610816 |