Deposition and characterization of high-K (Ca,Sr)ZrO3 thin films using sol-gel technique

• المؤلف الرئيسي: Yu, Ting
• مؤلفون آخرون: Zhu, Weiguang
• التنسيق: Theses and Dissertations
• منشور في: 2008
• الموضوعات: DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials; DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
• الوصول للمادة أونلاين: https://hdl.handle.net/10356/3434
• المؤسسة: Nanyang Technological University

There are growing interests in high-k dielectric materials because of their broad future applications for semiconductor industry such as alternative gate oxide, high-density storage capacitors, and high-voltage capacitors.The sol-gel derived CaxSr1-xZrO3 dielectric thin films have been systematicall...