Deposition and characterization of high-K (Ca,Sr)ZrO3 thin films using sol-gel technique

There are growing interests in high-k dielectric materials because of their broad future applications for semiconductor industry such as alternative gate oxide, high-density storage capacitors, and high-voltage capacitors.The sol-gel derived CaxSr1-xZrO3 dielectric thin films have been systematicall...

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Main Author:	Yu, Ting
Other Authors:	Zhu, Weiguang
Format:	Theses and Dissertations
Published:	2008
Subjects:	DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
Online Access:	https://hdl.handle.net/10356/3434
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Institution:	Nanyang Technological University

id	sg-ntu-dr.10356-3434
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spelling	sg-ntu-dr.10356-34342023-07-04T17:11:12Z Deposition and characterization of high-K (Ca,Sr)ZrO3 thin films using sol-gel technique Yu, Ting Zhu, Weiguang School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films There are growing interests in high-k dielectric materials because of their broad future applications for semiconductor industry such as alternative gate oxide, high-density storage capacitors, and high-voltage capacitors.The sol-gel derived CaxSr1-xZrO3 dielectric thin films have been systematically investigated for potential electronic device applications. DOCTOR OF PHILOSOPHY (EEE) 2008-09-17T09:30:07Z 2008-09-17T09:30:07Z 2005 2005 Thesis Yu, T. (2005). Deposition and characterization of high-K (Ca,Sr)ZrO3 thin films using sol-gel technique. Doctoral thesis, Nanyang Technological University, Singapore. https://hdl.handle.net/10356/3434 10.32657/10356/3434 Nanyang Technological University application/pdf
institution	Nanyang Technological University
building	NTU Library
continent	Asia
country	Singapore Singapore
content_provider	NTU Library
collection	DR-NTU
topic	DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
spellingShingle	DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films Yu, Ting Deposition and characterization of high-K (Ca,Sr)ZrO3 thin films using sol-gel technique
description	There are growing interests in high-k dielectric materials because of their broad future applications for semiconductor industry such as alternative gate oxide, high-density storage capacitors, and high-voltage capacitors.The sol-gel derived CaxSr1-xZrO3 dielectric thin films have been systematically investigated for potential electronic device applications.
author2	Zhu, Weiguang
author_facet	Zhu, Weiguang Yu, Ting
format	Theses and Dissertations
author	Yu, Ting
author_sort	Yu, Ting
title	Deposition and characterization of high-K (Ca,Sr)ZrO3 thin films using sol-gel technique
title_short	Deposition and characterization of high-K (Ca,Sr)ZrO3 thin films using sol-gel technique
title_full	Deposition and characterization of high-K (Ca,Sr)ZrO3 thin films using sol-gel technique
title_fullStr	Deposition and characterization of high-K (Ca,Sr)ZrO3 thin films using sol-gel technique
title_full_unstemmed	Deposition and characterization of high-K (Ca,Sr)ZrO3 thin films using sol-gel technique
title_sort	deposition and characterization of high-k (ca,sr)zro3 thin films using sol-gel technique
publishDate	2008
url	https://hdl.handle.net/10356/3434
_version_	1772829127739441152

Deposition and characterization of high-K (Ca,Sr)ZrO3 thin films using sol-gel technique

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