Characterization of flourosilicate glass (FSG) as low dielectric constant material

• Main Author: Teh, Young Way.
• Other Authors: Wong, Terence Kin Shun
• Format: Theses and Dissertations
• Published: 2008
• Subjects: DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials
• Online Access: http://hdl.handle.net/10356/3542
• Institution: Nanyang Technological University

The characterization of flourine doped oxide (FSG) film as a low-k- dielectric material involved three main parts. In the first part of the project, the effect flourine incorporation and increasing flourine content on the film structure and dielectric constant were studied. The incorporation of Si-...