Development of NTU CMOS process for SiGe BiCMOS technology

• المؤلف الرئيسي: Wang, Jianpeng.
• مؤلفون آخرون: Tse, Man Siu
• التنسيق: Theses and Dissertations
• منشور في: 2008
• الموضوعات: DRNTU::Engineering::Electrical and electronic engineering::Integrated circuits
• الوصول للمادة أونلاين: http://hdl.handle.net/10356/3663
• المؤسسة: Nanyang Technological University

Wafer fabrication was completed in the Micro Fabrication laboratory (MFL) on two types of starting substrate. Electrical measurement of the fabricated devices showed that selected parameters in the DOE slightly missed the target values. Based on the electrical measurement results, a new set of param...