Development of NTU CMOS process for SiGe BiCMOS technology
Wafer fabrication was completed in the Micro Fabrication laboratory (MFL) on two types of starting substrate. Electrical measurement of the fabricated devices showed that selected parameters in the DOE slightly missed the target values. Based on the electrical measurement results, a new set of param...
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Format: | Theses and Dissertations |
Published: |
2008
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Online Access: | http://hdl.handle.net/10356/3663 |
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Institution: | Nanyang Technological University |