Development of NTU CMOS process for SiGe BiCMOS technology
Wafer fabrication was completed in the Micro Fabrication laboratory (MFL) on two types of starting substrate. Electrical measurement of the fabricated devices showed that selected parameters in the DOE slightly missed the target values. Based on the electrical measurement results, a new set of param...
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2008
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sg-ntu-dr.10356-36632023-07-04T15:01:12Z Development of NTU CMOS process for SiGe BiCMOS technology Wang, Jianpeng. Tse, Man Siu School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Integrated circuits Wafer fabrication was completed in the Micro Fabrication laboratory (MFL) on two types of starting substrate. Electrical measurement of the fabricated devices showed that selected parameters in the DOE slightly missed the target values. Based on the electrical measurement results, a new set of parameters for DOE is proposed for another round of wafer fabrication. Master of Science (Microelectronics) 2008-09-17T09:34:45Z 2008-09-17T09:34:45Z 2002 2002 Thesis http://hdl.handle.net/10356/3663 Nanyang Technological University application/pdf |
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Nanyang Technological University |
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Asia |
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Singapore Singapore |
| content_provider |
NTU Library |
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DRNTU::Engineering::Electrical and electronic engineering::Integrated circuits |
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DRNTU::Engineering::Electrical and electronic engineering::Integrated circuits Wang, Jianpeng. Development of NTU CMOS process for SiGe BiCMOS technology |
| description |
Wafer fabrication was completed in the Micro Fabrication laboratory (MFL) on two types of starting substrate. Electrical measurement of the fabricated devices showed that selected parameters in the DOE slightly missed the target values. Based on the electrical measurement results, a new set of parameters for DOE is proposed for another round of wafer fabrication. |
| author2 |
Tse, Man Siu |
| author_facet |
Tse, Man Siu Wang, Jianpeng. |
| format |
Theses and Dissertations |
| author |
Wang, Jianpeng. |
| author_sort |
Wang, Jianpeng. |
| title |
Development of NTU CMOS process for SiGe BiCMOS technology |
| title_short |
Development of NTU CMOS process for SiGe BiCMOS technology |
| title_full |
Development of NTU CMOS process for SiGe BiCMOS technology |
| title_fullStr |
Development of NTU CMOS process for SiGe BiCMOS technology |
| title_full_unstemmed |
Development of NTU CMOS process for SiGe BiCMOS technology |
| title_sort |
development of ntu cmos process for sige bicmos technology |
| publishDate |
2008 |
| url |
http://hdl.handle.net/10356/3663 |
| _version_ |
1772825421913522176 |