Development of NTU CMOS process for SiGe BiCMOS technology

Wafer fabrication was completed in the Micro Fabrication laboratory (MFL) on two types of starting substrate. Electrical measurement of the fabricated devices showed that selected parameters in the DOE slightly missed the target values. Based on the electrical measurement results, a new set of param...

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Bibliographic Details
Main Author: Wang, Jianpeng.
Other Authors: Tse, Man Siu
Format: Theses and Dissertations
Published: 2008
Subjects:
Online Access:http://hdl.handle.net/10356/3663
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Institution: Nanyang Technological University
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