A study on ion implant uniformity

• Main Author: Chen, Xiao Song.
• Other Authors: Ling, Keck Voon
• Format: Theses and Dissertations
• Published: 2008
• Subjects: DRNTU::Engineering::Electrical and electronic engineering::Semiconductors
• Online Access: http://hdl.handle.net/10356/3893
• Institution: Nanyang Technological University

As a result of the recombination of electrons with the positive dopant ion species, neutral dopant atoms (no charge) are created during the process of ion being injected into wafer. Since the Faraday System (an instrument to measure Beam current) can only count charged atoms, the neutral dopant atom...