Development of highly photosensitive low loss inorganic sol-gel films for direct ultraviolet-imprinting of planar waveguides

Development of highly photosensitive low loss inorganic sol-gel films for direct ultraviolet-imprinting of planar waveguides

Highly photosensitive sol-gel derived inorganic 0.2GeO2:0.8SiO2 (germanosilicate) films have been developed to simplify the fabrication of photonic devices using a single step direct UV-imprinting (DUI) technique. The KrF excimer laser (248 nm) light induced refractive index change (?n) of germanosi...

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書目詳細資料
主要作者:	Rajni
其他作者:	Kantisara Pita
格式:	Theses and Dissertations
出版:	2008
主題:	DRNTU::Engineering::Electrical and electronic engineering::Electronic apparatus and materials DRNTU::Engineering::Electrical and electronic engineering::Antennas, wave guides, microwaves, radar, radio
在線閱讀:	https://hdl.handle.net/10356/4113
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!

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