Application of carbon nanotubes (CNTS) in copper/low k interconnects design

• Main Author: Loo, Shane Zhi Yuan
• Other Authors: Sridhar Idapalapati
• Format: Theses and Dissertations
• Language: English
• Published: 2010
• Subjects: DRNTU::Engineering::Electrical and electronic engineering::Microelectronics; DRNTU::Engineering::Nanotechnology
• Online Access: https://hdl.handle.net/10356/41444
• Institution: Nanyang Technological University

With continuing device scaling from a 90nm to a 65nm node, wiring interconnect becomes increasingly crucial due to the effects on electrical resistance and wiring capacitance. The electrical resistance and parasitic capacitance associated with these metal interconnections has become a major factor...