Characterization and reliability studies of oxides grown by wet and dry oxidations for 0.25 micrometer CMOS technology
The main focus of this report is to improve the hot-carrier lifetime of a 0.25 micrometer CMOS device.
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| Format: | Theses and Dissertations |
| Published: |
2008
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| Online Access: | http://hdl.handle.net/10356/4166 |
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| Institution: | Nanyang Technological University |