Characterization and reliability studies of oxides grown by wet and dry oxidations for 0.25 micrometer CMOS technology
The main focus of this report is to improve the hot-carrier lifetime of a 0.25 micrometer CMOS device.
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Format: | Theses and Dissertations |
Published: |
2008
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Online Access: | http://hdl.handle.net/10356/4166 |
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Institution: | Nanyang Technological University |
Summary: | The main focus of this report is to improve the hot-carrier lifetime of a 0.25 micrometer CMOS device. |
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