Study of breakdown in ultrathin gate dielectrics in nanoscale MOSFETs

• Main Author: Lo, Vui Lip
• Other Authors: Tung Chih Hang
• Format: Theses and Dissertations
• Language: English
• Published: 2010
• Subjects: DRNTU::Engineering::Electrical and electronic engineering::Nanoelectronics
• Online Access: https://hdl.handle.net/10356/41807
• Institution: Nanyang Technological University

Progressive breakdown has been found to provide an extra post-breakdown reliability margin for devices with ultrathin gate oxide. It is primarily constituted by two major regions, which are digital and analog breakdown. In this project, the progressive breakdown in the ultrathin gate oxide is thorou...