Effect of thermal-induced stress on SOI power devices

Silicon-on-insulator (SOI) technology presents one way of fabricating semiconductor devices on an insulating substrate rather than in a semiconductor bulk. It is a promising potential technology for the next generation ULSI because of its many advantages over its bulk silicon substrate counterpart,...

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Bibliographic Details
Main Author: Huang, Guangyu
Other Authors: Tan Cher Ming
Format: Theses and Dissertations
Language:English
Published: 2011
Subjects:
Online Access:https://hdl.handle.net/10356/42905
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Institution: Nanyang Technological University
Language: English
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