0.13-micron CMOS device characterization
This project emphasizes more on the transistor electrical characterization aspect as the input Front End of Line parameters are varied. This report covers the characterization of a fully working 0.13 um device with three layer metal copper Dual Damascene backend process.
Saved in:
Main Author: | |
---|---|
Other Authors: | |
Format: | Theses and Dissertations |
Published: |
2008
|
Subjects: | |
Online Access: | http://hdl.handle.net/10356/4564 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | Nanyang Technological University |
id |
sg-ntu-dr.10356-4564 |
---|---|
record_format |
dspace |
spelling |
sg-ntu-dr.10356-45642023-07-04T15:37:28Z 0.13-micron CMOS device characterization Lazuardi, Stephen Krishnamachar Prasad School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Microelectronics This project emphasizes more on the transistor electrical characterization aspect as the input Front End of Line parameters are varied. This report covers the characterization of a fully working 0.13 um device with three layer metal copper Dual Damascene backend process. Master of Science (Microelectronics) 2008-09-17T09:54:22Z 2008-09-17T09:54:22Z 2002 2002 Thesis http://hdl.handle.net/10356/4564 Nanyang Technological University 112 p. application/pdf |
institution |
Nanyang Technological University |
building |
NTU Library |
continent |
Asia |
country |
Singapore Singapore |
content_provider |
NTU Library |
collection |
DR-NTU |
topic |
DRNTU::Engineering::Electrical and electronic engineering::Microelectronics |
spellingShingle |
DRNTU::Engineering::Electrical and electronic engineering::Microelectronics Lazuardi, Stephen 0.13-micron CMOS device characterization |
description |
This project emphasizes more on the transistor electrical characterization aspect as the input Front End of Line parameters are varied. This report covers the characterization of a fully working 0.13 um device with three layer metal copper Dual Damascene backend process. |
author2 |
Krishnamachar Prasad |
author_facet |
Krishnamachar Prasad Lazuardi, Stephen |
format |
Theses and Dissertations |
author |
Lazuardi, Stephen |
author_sort |
Lazuardi, Stephen |
title |
0.13-micron CMOS device characterization |
title_short |
0.13-micron CMOS device characterization |
title_full |
0.13-micron CMOS device characterization |
title_fullStr |
0.13-micron CMOS device characterization |
title_full_unstemmed |
0.13-micron CMOS device characterization |
title_sort |
0.13-micron cmos device characterization |
publishDate |
2008 |
url |
http://hdl.handle.net/10356/4564 |
_version_ |
1772827525481758720 |