Optimization and comparison of argon plasma-induced quantum well intermixing using RIE and ICP
In this project, a novel quantum well intermixing (QWI) technique using inductively-coupled (ICP) and reactive-ion etcher (RIE) Argon plasma exposure has been developed.
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| Format: | Theses and Dissertations |
| Published: |
2008
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| Online Access: | http://hdl.handle.net/10356/4597 |
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| Institution: | Nanyang Technological University |
| Summary: | In this project, a novel quantum well intermixing (QWI) technique using inductively-coupled (ICP) and reactive-ion etcher (RIE) Argon plasma exposure has been developed. |
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