Optimization and comparison of argon plasma-induced quantum well intermixing using RIE and ICP

• المؤلف الرئيسي: Leong, Daniel Woon Loong.
• مؤلفون آخرون: Ang, Ricky Lay Kee
• التنسيق: Theses and Dissertations
• منشور في: 2008
• الموضوعات: DRNTU::Engineering::Electrical and electronic engineering::Optics, optoelectronics, photonics
• الوصول للمادة أونلاين: http://hdl.handle.net/10356/4597

In this project, a novel quantum well intermixing (QWI) technique using inductively-coupled (ICP) and reactive-ion etcher (RIE) Argon plasma exposure has been developed.