Power MOSFET yield improvement through the improvement and refinement of epitaxy process

The work involved in this project is yield improvement of Power MOSFET (PMOS) wafers manufactured in STMicroelectronics. The yield improvement was achieved through the improvement and refinement of Epitaxy process.

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Bibliographic Details
Main Author:	Ng, Kin Meng.
Other Authors:	Prasad, Krishnamachar
Format:	Theses and Dissertations
Published:	2008
Subjects:	DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
Online Access:	http://hdl.handle.net/10356/4954
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Institution:	Nanyang Technological University

id	sg-ntu-dr.10356-4954
record_format	dspace
spelling	sg-ntu-dr.10356-49542023-07-04T15:44:11Z Power MOSFET yield improvement through the improvement and refinement of epitaxy process Ng, Kin Meng. Prasad, Krishnamachar School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Microelectronics The work involved in this project is yield improvement of Power MOSFET (PMOS) wafers manufactured in STMicroelectronics. The yield improvement was achieved through the improvement and refinement of Epitaxy process. Master of Science (Microelectronics) 2008-09-17T10:02:08Z 2008-09-17T10:02:08Z 2003 2003 Thesis http://hdl.handle.net/10356/4954 Nanyang Technological University application/pdf
institution	Nanyang Technological University
building	NTU Library
continent	Asia
country	Singapore Singapore
content_provider	NTU Library
collection	DR-NTU
topic	DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
spellingShingle	DRNTU::Engineering::Electrical and electronic engineering::Microelectronics Ng, Kin Meng. Power MOSFET yield improvement through the improvement and refinement of epitaxy process
description	The work involved in this project is yield improvement of Power MOSFET (PMOS) wafers manufactured in STMicroelectronics. The yield improvement was achieved through the improvement and refinement of Epitaxy process.
author2	Prasad, Krishnamachar
author_facet	Prasad, Krishnamachar Ng, Kin Meng.
format	Theses and Dissertations
author	Ng, Kin Meng.
author_sort	Ng, Kin Meng.
title	Power MOSFET yield improvement through the improvement and refinement of epitaxy process
title_short	Power MOSFET yield improvement through the improvement and refinement of epitaxy process
title_full	Power MOSFET yield improvement through the improvement and refinement of epitaxy process
title_fullStr	Power MOSFET yield improvement through the improvement and refinement of epitaxy process
title_full_unstemmed	Power MOSFET yield improvement through the improvement and refinement of epitaxy process
title_sort	power mosfet yield improvement through the improvement and refinement of epitaxy process
publishDate	2008
url	http://hdl.handle.net/10356/4954
_version_	1772825404648718336

Power MOSFET yield improvement through the improvement and refinement of epitaxy process

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