Power MOSFET yield improvement through the improvement and refinement of epitaxy process
The work involved in this project is yield improvement of Power MOSFET (PMOS) wafers manufactured in STMicroelectronics. The yield improvement was achieved through the improvement and refinement of Epitaxy process.
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Main Author: | Ng, Kin Meng. |
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Other Authors: | Prasad, Krishnamachar |
Format: | Theses and Dissertations |
Published: |
2008
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Subjects: | |
Online Access: | http://hdl.handle.net/10356/4954 |
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Institution: | Nanyang Technological University |
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