Characterization of GaN-based HEMT structures for high power applications

GaN based HEMT devices on 4 inch Si (111) were characterized to study their electrical parameters, using Hall Effect, Current-Voltage and Capacitance-Voltage measurements. Four different types of structure configurations were studied, which include different stress mitigating layers with carbon dopi...

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Bibliographic Details
Main Author: Pang, Shi Xiang.
Other Authors: K Radhakrishnan
Format: Final Year Project
Language:English
Published: 2013
Subjects:
Online Access:http://hdl.handle.net/10356/54247
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Institution: Nanyang Technological University
Language: English