Electrical characterization of the novel vertical slit field-effect transistor (VeSFET)

A junctionless Vertical Slit Field-Effect Transistor (VeSFET) fabricated on SOI wafer using conventional CMOS process was proposed by W. Maly, et al.[1]. This new architecture device has two symmetrical independent gates with a three-dimensional channel. This device structure is to overcome the chal...

Full description

Saved in:
Bibliographic Details
Main Author: Tung, Zhi Yan.
Other Authors: Ang Diing Shenp
Format: Final Year Project
Language:English
Published: 2012
Subjects:
Online Access:http://hdl.handle.net/10356/50177
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: Nanyang Technological University
Language: English