Effect of stress migration on electromigration for nano scale advanced interconnects
The interconnect system is a significant part of the integrated circuit because of its function to connect millions of transistors, and routing signals into and out of the chip. Therefore, investigating its reliability is a priority for the industry to ensure that the chip lifetime will meet the req...
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| 格式: | Theses and Dissertations |
| 語言: | English |
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2012
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| 主題: | |
| 在線閱讀: | https://hdl.handle.net/10356/50271 |
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