Simulation of thermal behavior of silica glass and silicon with pulse laser heating
This project made use of a 3D model to study the thermo behavior of silica glass and silicon material under Continuous wave laser annealing (cw LA). Two simulations were carried out to illustrate different scenarios, including static laser, rotating wafer with moving laser. Simulated result...
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| Format: | Final Year Project |
| Language: | English |
| Published: |
2013
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| Subjects: | |
| Online Access: | http://hdl.handle.net/10356/52252 |
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| Institution: | Nanyang Technological University |
| Language: | English |
| Summary: | This project made use of a 3D model to study the thermo behavior of silica glass
and silicon material under Continuous wave laser annealing (cw LA). Two
simulations were carried out to illustrate different scenarios, including static laser,
rotating wafer with moving laser. Simulated results of the temperature distribution
within the sample material are demonstrated for both models. Comparisons of
temperature distribution under different laser power density were shown. The
model is able to measure and predict processing temperature of the sample up to
its melting point. |
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