Simulation of thermal behavior of silica glass and silicon with pulse laser heating

This project made use of a 3D model to study the thermo behavior of silica glass and silicon material under Continuous wave laser annealing (cw LA). Two simulations were carried out to illustrate different scenarios, including static laser, rotating wafer with moving laser. Simulated result...

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Bibliographic Details
Main Author:	Liu, Mojia.
Other Authors:	Su Haibin
Format:	Final Year Project
Language:	English
Published:	2013
Subjects:	DRNTU::Engineering::Materials::Testing of materials
Online Access:	http://hdl.handle.net/10356/52252
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Institution:	Nanyang Technological University
Language:	English

id	sg-ntu-dr.10356-52252
record_format	dspace
spelling	sg-ntu-dr.10356-522522023-03-04T15:37:36Z Simulation of thermal behavior of silica glass and silicon with pulse laser heating Liu, Mojia. Su Haibin School of Materials Science and Engineering DRNTU::Engineering::Materials::Testing of materials This project made use of a 3D model to study the thermo behavior of silica glass and silicon material under Continuous wave laser annealing (cw LA). Two simulations were carried out to illustrate different scenarios, including static laser, rotating wafer with moving laser. Simulated results of the temperature distribution within the sample material are demonstrated for both models. Comparisons of temperature distribution under different laser power density were shown. The model is able to measure and predict processing temperature of the sample up to its melting point. Bachelor of Engineering (Materials Engineering) 2013-04-26T03:32:42Z 2013-04-26T03:32:42Z 2013 2013 Final Year Project (FYP) http://hdl.handle.net/10356/52252 en Nanyang Technological University 45 p. application/pdf
institution	Nanyang Technological University
building	NTU Library
continent	Asia
country	Singapore Singapore
content_provider	NTU Library
collection	DR-NTU
language	English
topic	DRNTU::Engineering::Materials::Testing of materials
spellingShingle	DRNTU::Engineering::Materials::Testing of materials Liu, Mojia. Simulation of thermal behavior of silica glass and silicon with pulse laser heating
description	This project made use of a 3D model to study the thermo behavior of silica glass and silicon material under Continuous wave laser annealing (cw LA). Two simulations were carried out to illustrate different scenarios, including static laser, rotating wafer with moving laser. Simulated results of the temperature distribution within the sample material are demonstrated for both models. Comparisons of temperature distribution under different laser power density were shown. The model is able to measure and predict processing temperature of the sample up to its melting point.
author2	Su Haibin
author_facet	Su Haibin Liu, Mojia.
format	Final Year Project
author	Liu, Mojia.
author_sort	Liu, Mojia.
title	Simulation of thermal behavior of silica glass and silicon with pulse laser heating
title_short	Simulation of thermal behavior of silica glass and silicon with pulse laser heating
title_full	Simulation of thermal behavior of silica glass and silicon with pulse laser heating
title_fullStr	Simulation of thermal behavior of silica glass and silicon with pulse laser heating
title_full_unstemmed	Simulation of thermal behavior of silica glass and silicon with pulse laser heating
title_sort	simulation of thermal behavior of silica glass and silicon with pulse laser heating
publishDate	2013
url	http://hdl.handle.net/10356/52252
_version_	1759858160904962048

Simulation of thermal behavior of silica glass and silicon with pulse laser heating

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