Selective emitters prepared by high density plasma immersion ion implantation (HD-PIII) in silicon wafer based solar cell

• Main Author: Seow, Leslie Kai Tong.
• Other Authors: Sun Changqing
• Format: Final Year Project
• Language: English
• Published: 2013
• Subjects: DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
• Online Access: http://hdl.handle.net/10356/53370
• Institution: Nanyang Technological University

Plasma Ion Immersion Implantation is a rapidly developing modification technique used for doping the near-surface regions of materials by implanting energetic ions from plasma, which will surround the sample in the vacuum chamber. This technique is widely known for its accuracy for dopant concentrat...