Design of an optical MEMS flow sensor in CMOS technology
Miniaturization is a popular topic in today's semiconductor's industry, the chip size has dropped to micrometer level and dimension of transistor has dropped to nanometer level up to date. Therefore the accuracy becomes the bottleneck of the manufacturing process in the semiconductor indus...
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| Format: | Theses and Dissertations |
| Published: |
2008
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| Online Access: | http://hdl.handle.net/10356/5403 |
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| Institution: | Nanyang Technological University |
| Summary: | Miniaturization is a popular topic in today's semiconductor's industry, the chip size has dropped to micrometer level and dimension of transistor has dropped to nanometer level up to date. Therefore the accuracy becomes the bottleneck of the manufacturing process in the semiconductor industry. If there is one-micrometer deviation error in a rotor of a precise watch, the watch will still be able to tell the user the accurate time and be considered as a good end product. When one-micrometer deviation error happens to a micro-meter-level transistor chip, it becomes a ratal error. The deviation error causes bad final products. |
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