Design of an optical MEMS flow sensor in CMOS technology

Miniaturization is a popular topic in today's semiconductor's industry, the chip size has dropped to micrometer level and dimension of transistor has dropped to nanometer level up to date. Therefore the accuracy becomes the bottleneck of the manufacturing process in the semiconductor indus...

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Main Author: Wu, Dong Qin.
Other Authors: Chollet, Franck Alexis
Format: Theses and Dissertations
Published: 2008
Subjects:
Online Access:http://hdl.handle.net/10356/5403
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Institution: Nanyang Technological University
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spelling sg-ntu-dr.10356-54032023-03-11T17:08:01Z Design of an optical MEMS flow sensor in CMOS technology Wu, Dong Qin. Chollet, Franck Alexis School of Mechanical and Aerospace Engineering DRNTU::Engineering::Manufacturing Miniaturization is a popular topic in today's semiconductor's industry, the chip size has dropped to micrometer level and dimension of transistor has dropped to nanometer level up to date. Therefore the accuracy becomes the bottleneck of the manufacturing process in the semiconductor industry. If there is one-micrometer deviation error in a rotor of a precise watch, the watch will still be able to tell the user the accurate time and be considered as a good end product. When one-micrometer deviation error happens to a micro-meter-level transistor chip, it becomes a ratal error. The deviation error causes bad final products. Master of Science (Mechanics & Processing of Materials) 2008-09-17T10:49:44Z 2008-09-17T10:49:44Z 2006 2006 Thesis http://hdl.handle.net/10356/5403 Nanyang Technological University application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
topic DRNTU::Engineering::Manufacturing
spellingShingle DRNTU::Engineering::Manufacturing
Wu, Dong Qin.
Design of an optical MEMS flow sensor in CMOS technology
description Miniaturization is a popular topic in today's semiconductor's industry, the chip size has dropped to micrometer level and dimension of transistor has dropped to nanometer level up to date. Therefore the accuracy becomes the bottleneck of the manufacturing process in the semiconductor industry. If there is one-micrometer deviation error in a rotor of a precise watch, the watch will still be able to tell the user the accurate time and be considered as a good end product. When one-micrometer deviation error happens to a micro-meter-level transistor chip, it becomes a ratal error. The deviation error causes bad final products.
author2 Chollet, Franck Alexis
author_facet Chollet, Franck Alexis
Wu, Dong Qin.
format Theses and Dissertations
author Wu, Dong Qin.
author_sort Wu, Dong Qin.
title Design of an optical MEMS flow sensor in CMOS technology
title_short Design of an optical MEMS flow sensor in CMOS technology
title_full Design of an optical MEMS flow sensor in CMOS technology
title_fullStr Design of an optical MEMS flow sensor in CMOS technology
title_full_unstemmed Design of an optical MEMS flow sensor in CMOS technology
title_sort design of an optical mems flow sensor in cmos technology
publishDate 2008
url http://hdl.handle.net/10356/5403
_version_ 1761781836107743232