TiO2 thin films by APCVD for photocatalytic applications
Titanium dioxide thin film was deposited on glass using in-house built Atmospheric Pressure Chemical Vapor Deposition. The system was capable of depositing uniform coating on a large substrate and can be scaled-up easily for industrial applications. The deposited film consists of photocatalytic anat...
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sg-ntu-dr.10356-546602023-07-04T17:10:19Z TiO2 thin films by APCVD for photocatalytic applications Chua, Chin Sheng Ding Xing Zhao Andrew Soutar Tan Ooi Kiang Tse Man Siu School of Electrical and Electronic Engineering A*STAR Singapore Institute of Manufacturing Technology DRNTU::Engineering::Electrical and electronic engineering::Semiconductors DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films Titanium dioxide thin film was deposited on glass using in-house built Atmospheric Pressure Chemical Vapor Deposition. The system was capable of depositing uniform coating on a large substrate and can be scaled-up easily for industrial applications. The deposited film consists of photocatalytic anatase phase and was shown to degrade both stearic acid and ethyl cellulose contaminations that were deposited on top of the films. Various modifications were carried out to improve the UV and visible light photo-response of the TiO2 film; thermal annealing, embedding photocatalytic particles (Anatase, rutile, P25 and SrTi(1-x)FexO3), tin-doping and deposition of TiO2/SnO2 bilayer. Among these various modifications, embedding P25 nanoparticles and-tin doping showed enhancement to the degradation rate of stearic acid under UV illumination. Other modifications suffered from a loss of photoactivity cause primarily by the introduction of recombination centers and increased in grain size. DOCTOR OF PHILOSOPHY (EEE) 2013-07-15T04:46:54Z 2013-07-15T04:46:54Z 2013 2013 Thesis Chua, C. S. (2013). TiO2 thin films by APCVD for photocatalytic applications. Doctoral thesis, Nanyang Technological University, Singapore. https://hdl.handle.net/10356/54660 10.32657/10356/54660 en 154 p. application/pdf |
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DRNTU::Engineering::Electrical and electronic engineering::Semiconductors DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films Chua, Chin Sheng TiO2 thin films by APCVD for photocatalytic applications |
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Titanium dioxide thin film was deposited on glass using in-house built Atmospheric Pressure Chemical Vapor Deposition. The system was capable of depositing uniform coating on a large substrate and can be scaled-up easily for industrial applications. The deposited film consists of photocatalytic anatase phase and was shown to degrade both stearic acid and ethyl cellulose contaminations that were deposited on top of the films. Various modifications were carried out to improve the UV and visible light photo-response of the TiO2 film; thermal annealing, embedding photocatalytic particles (Anatase, rutile, P25 and SrTi(1-x)FexO3), tin-doping and deposition of TiO2/SnO2 bilayer. Among these various modifications, embedding P25 nanoparticles and-tin doping showed enhancement to the degradation rate of stearic acid under UV illumination. Other modifications suffered from a loss of photoactivity cause primarily by the introduction of recombination centers and increased in grain size. |
author2 |
Ding Xing Zhao |
author_facet |
Ding Xing Zhao Chua, Chin Sheng |
format |
Theses and Dissertations |
author |
Chua, Chin Sheng |
author_sort |
Chua, Chin Sheng |
title |
TiO2 thin films by APCVD for photocatalytic applications |
title_short |
TiO2 thin films by APCVD for photocatalytic applications |
title_full |
TiO2 thin films by APCVD for photocatalytic applications |
title_fullStr |
TiO2 thin films by APCVD for photocatalytic applications |
title_full_unstemmed |
TiO2 thin films by APCVD for photocatalytic applications |
title_sort |
tio2 thin films by apcvd for photocatalytic applications |
publishDate |
2013 |
url |
https://hdl.handle.net/10356/54660 |
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1772829031953072128 |