TiO2 thin films by APCVD for photocatalytic applications

• Main Author: Chua, Chin Sheng
• Other Authors: Ding Xing Zhao
• Format: Theses and Dissertations
• Language: English
• Published: 2013
• Subjects: DRNTU::Engineering::Electrical and electronic engineering::Semiconductors; DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
• Online Access: https://hdl.handle.net/10356/54660
• Institution: Nanyang Technological University

Titanium dioxide thin film was deposited on glass using in-house built Atmospheric Pressure Chemical Vapor Deposition. The system was capable of depositing uniform coating on a large substrate and can be scaled-up easily for industrial applications. The deposited film consists of photocatalytic anat...