TiO2 thin films by APCVD for photocatalytic applications

Titanium dioxide thin film was deposited on glass using in-house built Atmospheric Pressure Chemical Vapor Deposition. The system was capable of depositing uniform coating on a large substrate and can be scaled-up easily for industrial applications. The deposited film consists of photocatalytic anat...

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Bibliographic Details
Main Author: Chua, Chin Sheng
Other Authors: Ding Xing Zhao
Format: Theses and Dissertations
Language:English
Published: 2013
Subjects:
Online Access:https://hdl.handle.net/10356/54660
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Institution: Nanyang Technological University
Language: English
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