Electrical reliability of ultra-low k dielectric of an IC device of its optical spectroscopic characterization
In summary, electrical reliability of ultra-low k dielectrics of leading edge semiconductor Integrated circuits (IC) was investigated using complimentary vibrational spectroscopy of Raman and Fourier Transform Infra-Red (FTIR). In order to reduce the resistance and capacitance (RC) delay in advanced...
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| 格式: | Theses and Dissertations |
| 語言: | English |
| 出版: |
2014
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| 主題: | |
| 在線閱讀: | https://hdl.handle.net/10356/55289 |
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| 機構: | Nanyang Technological University |
| 語言: | English |