Electrical reliability of ultra-low k dielectric of an IC device of its optical spectroscopic characterization
In summary, electrical reliability of ultra-low k dielectrics of leading edge semiconductor Integrated circuits (IC) was investigated using complimentary vibrational spectroscopy of Raman and Fourier Transform Infra-Red (FTIR). In order to reduce the resistance and capacitance (RC) delay in advanced...
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| Format: | Theses and Dissertations |
| Language: | English |
| Published: |
2014
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| Online Access: | https://hdl.handle.net/10356/55289 |
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| Institution: | Nanyang Technological University |
| Language: | English |