Growth and characterization of low-k dielectrics for multilevel interconnect applications

• Main Author: Wang, Minrui
• Other Authors: Rusli
• Format: Theses and Dissertations
• Published: 2008
• Subjects: DRNTU::Engineering::Electrical and electronic engineering::Electronic packaging; DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Nanoelectronics and interconnects
• Online Access: https://hdl.handle.net/10356/3674
• Institution: Nanyang Technological University

This thesis focuses on the growth and characterization of carbon doped silicon oxide (SiO(C,H)) low k dielectrics for multilevel interconnect applications.