Growth and characterization of low-k dielectrics for multilevel interconnect applications

This thesis focuses on the growth and characterization of carbon doped silicon oxide (SiO(C,H)) low k dielectrics for multilevel interconnect applications.

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Bibliographic Details
Main Author:	Wang, Minrui
Other Authors:	Rusli
Format:	Theses and Dissertations
Published:	2008
Subjects:	DRNTU::Engineering::Electrical and electronic engineering::Electronic packaging DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Nanoelectronics and interconnects
Online Access:	https://hdl.handle.net/10356/3674
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Institution:	Nanyang Technological University

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spelling	sg-ntu-dr.10356-36742023-07-04T16:42:35Z Growth and characterization of low-k dielectrics for multilevel interconnect applications Wang, Minrui Rusli School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Electronic packaging DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Nanoelectronics and interconnects This thesis focuses on the growth and characterization of carbon doped silicon oxide (SiO(C,H)) low k dielectrics for multilevel interconnect applications. MASTER OF ENGINEERING (EEE) 2008-09-17T09:34:59Z 2008-09-17T09:34:59Z 2005 2005 Thesis Wang, M. (2005). Growth and characterization of low-k dielectrics for multilevel interconnect applications. Master’s thesis, Nanyang Technological University, Singapore. https://hdl.handle.net/10356/3674 10.32657/10356/3674 Nanyang Technological University application/pdf
institution	Nanyang Technological University
building	NTU Library
continent	Asia
country	Singapore Singapore
content_provider	NTU Library
collection	DR-NTU
topic	DRNTU::Engineering::Electrical and electronic engineering::Electronic packaging DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Nanoelectronics and interconnects
spellingShingle	DRNTU::Engineering::Electrical and electronic engineering::Electronic packaging DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Nanoelectronics and interconnects Wang, Minrui Growth and characterization of low-k dielectrics for multilevel interconnect applications
description	This thesis focuses on the growth and characterization of carbon doped silicon oxide (SiO(C,H)) low k dielectrics for multilevel interconnect applications.
author2	Rusli
author_facet	Rusli Wang, Minrui
format	Theses and Dissertations
author	Wang, Minrui
author_sort	Wang, Minrui
title	Growth and characterization of low-k dielectrics for multilevel interconnect applications
title_short	Growth and characterization of low-k dielectrics for multilevel interconnect applications
title_full	Growth and characterization of low-k dielectrics for multilevel interconnect applications
title_fullStr	Growth and characterization of low-k dielectrics for multilevel interconnect applications
title_full_unstemmed	Growth and characterization of low-k dielectrics for multilevel interconnect applications
title_sort	growth and characterization of low-k dielectrics for multilevel interconnect applications
publishDate	2008
url	https://hdl.handle.net/10356/3674
_version_	1772826003983302656

Growth and characterization of low-k dielectrics for multilevel interconnect applications

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