Growth and characterization of low-k dielectrics for multilevel interconnect applications

Growth and characterization of low-k dielectrics for multilevel interconnect applications

This thesis focuses on the growth and characterization of carbon doped silicon oxide (SiO(C,H)) low k dielectrics for multilevel interconnect applications.

Saved in:
Bibliographic Details
Main Author: Wang, Minrui
Other Authors: Rusli
Format: Theses and Dissertations
Published: 2008
Subjects:
DRNTU::Engineering::Electrical and electronic engineering::Electronic packaging
DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Nanoelectronics and interconnects
Online Access:https://hdl.handle.net/10356/3674
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: Nanyang Technological University
Description
Summary:This thesis focuses on the growth and characterization of carbon doped silicon oxide (SiO(C,H)) low k dielectrics for multilevel interconnect applications.

Similar Items