Growth and characterization of low-k dielectrics for multilevel interconnect applications
This thesis focuses on the growth and characterization of carbon doped silicon oxide (SiO(C,H)) low k dielectrics for multilevel interconnect applications.
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Main Author: | Wang, Minrui |
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Other Authors: | Rusli |
Format: | Theses and Dissertations |
Published: |
2008
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Subjects: | |
Online Access: | https://hdl.handle.net/10356/3674 |
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Institution: | Nanyang Technological University |
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