Thin dielectric films with low dielectric constants for quarter micron devices

• Main Author: Chua, Chee Tee.
• Other Authors: School of Applied Science
• Format: Theses and Dissertations
• Language: English
• Published: 2009
• Subjects: DRNTU::Engineering::Materials
• Online Access: http://hdl.handle.net/10356/19336
• Institution: Nanyang Technological University

The use of low dielectric constant (k) materials results in higher speed devices in ULSI (ultra-large scale integration) technology, thereby making low k dielectrics an important area of research. There is a wide variety of low k materials which can be deposited using spin-on as well as chemical vap...