Characterization and optimization of aluminum nitride, poly silicon/thick silicon oxide and inter-facial investigation of Al-Ge eutectic bond

This project mainly documents the theory, experimental results and analysis of local stress and full map stress measurement of Aluminum Nitride film using SEMDEX A21, investigation of interface of Al-Ge Eutectic bond and startup and evaluation of Filmetrics (F64-c). Residual stress is a critical iss...

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Main Author: Kugatharshine, Selvaratnam
Other Authors: Tian Jingze
Format: Final Year Project
Language:English
Published: 2015
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Online Access:http://hdl.handle.net/10356/65691
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Institution: Nanyang Technological University
Language: English
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spelling sg-ntu-dr.10356-656912023-07-07T16:23:13Z Characterization and optimization of aluminum nitride, poly silicon/thick silicon oxide and inter-facial investigation of Al-Ge eutectic bond Kugatharshine, Selvaratnam Tian Jingze Ang Diing Shenp School of Electrical and Electronic Engineering GLOBALFOUNDRIES DRNTU::Engineering::Electrical and electronic engineering This project mainly documents the theory, experimental results and analysis of local stress and full map stress measurement of Aluminum Nitride film using SEMDEX A21, investigation of interface of Al-Ge Eutectic bond and startup and evaluation of Filmetrics (F64-c). Residual stress is a critical issue in thin film technology. With stressed film, defects such as dislocations, voids, and cracking may occur. Therefore local stress and full map stress measurement is essential to identify the issues related to the stress non-uniformity. This report explains the basic theory behind the stress induction and the working principle of the machinery used in the measurements, such as SEMDEX A21. Method of stress calculation in the various directions like, stress-x, stress-y, stress-45⁰, stress-135⁰, difference in stress x and y and, difference in stress 45⁰ and 135⁰ are clearly explained. Four templates were created to perform the stress calculation in various directions with step sizes of 0.7mm and 3.6mm in Macro Excel (VBA). Using the details obtained from full map stress distribution map, yield enhancement for tensile and compressive AlN film was done. Details of the experiment and the analysis carried out to investigate the interface of eutectic bond (Al -Ge) are mentioned in this report. Cross-Sectional Transmission Electron Microscopy (XTEM) and Energy-dispersive X-ray spectroscopy (EDX) analysis are done to check the cross section of interface and elements presence at the interface. Bonding conditions are also mentioned with the use of phase diagram. New metrology tool which is Filmetrics 64-c is capable of measuring the thickness of single and multi-films. To ensure the reliability of this tool, it’s matched with opti-probe which is also a thickness measurement machine. Reliability experiment details of single layer and multi-layers are explained in this article. Bachelor of Engineering 2015-12-10T02:14:40Z 2015-12-10T02:14:40Z 2015 2015 Final Year Project (FYP) http://hdl.handle.net/10356/65691 en Nanyang Technological University 59 p. application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
language English
topic DRNTU::Engineering::Electrical and electronic engineering
spellingShingle DRNTU::Engineering::Electrical and electronic engineering
Kugatharshine, Selvaratnam
Characterization and optimization of aluminum nitride, poly silicon/thick silicon oxide and inter-facial investigation of Al-Ge eutectic bond
description This project mainly documents the theory, experimental results and analysis of local stress and full map stress measurement of Aluminum Nitride film using SEMDEX A21, investigation of interface of Al-Ge Eutectic bond and startup and evaluation of Filmetrics (F64-c). Residual stress is a critical issue in thin film technology. With stressed film, defects such as dislocations, voids, and cracking may occur. Therefore local stress and full map stress measurement is essential to identify the issues related to the stress non-uniformity. This report explains the basic theory behind the stress induction and the working principle of the machinery used in the measurements, such as SEMDEX A21. Method of stress calculation in the various directions like, stress-x, stress-y, stress-45⁰, stress-135⁰, difference in stress x and y and, difference in stress 45⁰ and 135⁰ are clearly explained. Four templates were created to perform the stress calculation in various directions with step sizes of 0.7mm and 3.6mm in Macro Excel (VBA). Using the details obtained from full map stress distribution map, yield enhancement for tensile and compressive AlN film was done. Details of the experiment and the analysis carried out to investigate the interface of eutectic bond (Al -Ge) are mentioned in this report. Cross-Sectional Transmission Electron Microscopy (XTEM) and Energy-dispersive X-ray spectroscopy (EDX) analysis are done to check the cross section of interface and elements presence at the interface. Bonding conditions are also mentioned with the use of phase diagram. New metrology tool which is Filmetrics 64-c is capable of measuring the thickness of single and multi-films. To ensure the reliability of this tool, it’s matched with opti-probe which is also a thickness measurement machine. Reliability experiment details of single layer and multi-layers are explained in this article.
author2 Tian Jingze
author_facet Tian Jingze
Kugatharshine, Selvaratnam
format Final Year Project
author Kugatharshine, Selvaratnam
author_sort Kugatharshine, Selvaratnam
title Characterization and optimization of aluminum nitride, poly silicon/thick silicon oxide and inter-facial investigation of Al-Ge eutectic bond
title_short Characterization and optimization of aluminum nitride, poly silicon/thick silicon oxide and inter-facial investigation of Al-Ge eutectic bond
title_full Characterization and optimization of aluminum nitride, poly silicon/thick silicon oxide and inter-facial investigation of Al-Ge eutectic bond
title_fullStr Characterization and optimization of aluminum nitride, poly silicon/thick silicon oxide and inter-facial investigation of Al-Ge eutectic bond
title_full_unstemmed Characterization and optimization of aluminum nitride, poly silicon/thick silicon oxide and inter-facial investigation of Al-Ge eutectic bond
title_sort characterization and optimization of aluminum nitride, poly silicon/thick silicon oxide and inter-facial investigation of al-ge eutectic bond
publishDate 2015
url http://hdl.handle.net/10356/65691
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