Ordered boron nitride thin film growth with reactive magnetron sputtering

Boron Nitride thin films were deposited on pieces of diced Si wafer using High-power Impulse Magnetron Sputtering (HIPIMS) with a pure boron target. The growth parameters of N2 gas flow ratio and substrate temperature were varied. The thin films were characterised using Fourier Transform Infrared sp...

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Bibliographic Details
Main Author: Loh, Li Quan
Other Authors: Teo Hang Tong Edwin
Format: Final Year Project
Language:English
Published: 2017
Subjects:
Online Access:http://hdl.handle.net/10356/70626
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Institution: Nanyang Technological University
Language: English
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