Ordered boron nitride thin film growth with reactive magnetron sputtering

• المؤلف الرئيسي: Loh, Li Quan
• مؤلفون آخرون: Teo Hang Tong Edwin
• التنسيق: Final Year Project
• اللغة: English
• منشور في: 2017
• الموضوعات: DRNTU::Engineering::Materials
• الوصول للمادة أونلاين: http://hdl.handle.net/10356/70626
• المؤسسة: Nanyang Technological University

Boron Nitride thin films were deposited on pieces of diced Si wafer using High-power Impulse Magnetron Sputtering (HIPIMS) with a pure boron target. The growth parameters of N2 gas flow ratio and substrate temperature were varied. The thin films were characterised using Fourier Transform Infrared sp...