Carbon thin film deposition on plastic using FCVA
Carbon thin film technology has been present in many present applications, the type of substrate it can be deposited on, varies from metal to non-metal. Filtered Cathodic Vacuum Arc (FCVA) is one commonly used technique to deposit carbon thin film. This project will be using FCVA as the main depo...
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| 格式: | Final Year Project |
| 語言: | English |
| 出版: |
2017
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| 主題: | |
| 在線閱讀: | http://hdl.handle.net/10356/71189 |
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| 機構: | Nanyang Technological University |
| 語言: | English |
| 總結: | Carbon thin film technology has been present in many present applications, the type
of substrate it can be deposited on, varies from metal to non-metal. Filtered Cathodic
Vacuum Arc (FCVA) is one commonly used technique to deposit carbon thin film. This
project will be using FCVA as the main deposition technique, parameters such as
temperature and substrate bias affecting the surface energy are varied. Temperature
is varied from 10 to 600 degree Celsius, while the substrate bias is varied from 0V to
600V. Results shows that initial deposition on carbon surface can reach a very low
surface energy and achieve a contact angle of 1060. The optimal condition to achieve
this low surface energy is 300V substrate bias and 500 degree Celsius. As the
objective of the project is to achieve super-hydrophobic surface or contact angle more
than 1600, surface modification is suggested and done using post treatment
techniques. The highest contact angle sample from the initial deposition is adopted to
further reduce the surface energy. Post treatment using plasma technique is used,
contact angle measurement was recorded once again to compare the effectiveness of
the plasma technique. CF4 and SF6 plasma is used for this post treatment. Negative
results has been recorded and these gases has proven to improve the hydrophilicity
of the surface instead of improving the hydrophobicity of the surface. |
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