A New Threshold Voltage and Drain Current Model for Lightly/Heavily Doped Surrounding Gate MOSFETs
In this paper, we have presented a surface potential based drain current and threshold voltage model for surrounding gate MOSFETs that is valid for all doping concentrations. The Newton Raphson iterative technique is implemented for calculation of the potential at the surface and center of the chann...
Saved in:
Main Authors: | , , , , |
---|---|
其他作者: | |
格式: | Article |
語言: | English |
出版: |
2016
|
主題: | |
在線閱讀: | https://hdl.handle.net/10356/82922 http://hdl.handle.net/10220/40361 |
標簽: |
添加標簽
沒有標簽, 成為第一個標記此記錄!
|
機構: | Nanyang Technological University |
語言: | English |
成為第一個發表評論!