Microstructure and mechanical properties of Cu-containing amorphous carbon nanocomposite thin films by a hybrid deposition technique
Cu-containing amorphous carbon (a-C:Cu) films were deposited on Si (100) substrate by a hybrid process where co-operating of a filter cathodic vacuum arc (FCVA) and a magnetron sputtering (MS). Cu content was tuned by changing the Cu MS power density from 0 to 4.93 W/cm2. The results show that metal...
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Main Authors: | , , , , |
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Other Authors: | |
Format: | Article |
Language: | English |
Published: |
2019
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Subjects: | |
Online Access: | https://hdl.handle.net/10356/84626 http://hdl.handle.net/10220/49151 |
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Institution: | Nanyang Technological University |
Language: | English |
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