Microstructure and mechanical properties of Cu-containing amorphous carbon nanocomposite thin films by a hybrid deposition technique

Cu-containing amorphous carbon (a-C:Cu) films were deposited on Si (100) substrate by a hybrid process where co-operating of a filter cathodic vacuum arc (FCVA) and a magnetron sputtering (MS). Cu content was tuned by changing the Cu MS power density from 0 to 4.93 W/cm2. The results show that metal...

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Bibliographic Details
Main Authors: Luo, Jingying, Sun, Deen, Zhang, Sam, Qian, Haixia, Huang, Jiamu
Other Authors: School of Mechanical and Aerospace Engineering
Format: Article
Language:English
Published: 2019
Subjects:
Online Access:https://hdl.handle.net/10356/84626
http://hdl.handle.net/10220/49151
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Institution: Nanyang Technological University
Language: English

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