Determination of diffusion lengths with the use of EBIC from a diffused junction with any values of junction depths

Minority carrier diffusion lengths determine the performance of bipolar and photodiode devices. An electron-beaminduced-current (EBIC) method has been widely used to extract this parameter. The extraction of the diffusion lengths involves a p-n junction to collect the minority carriers. The most use...

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Main Authors: Ong, Vincent K. S., Kurniawan, Oka.
Other Authors: School of Electrical and Electronic Engineering
Format: Article
Language:English
Published: 2009
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Online Access:https://hdl.handle.net/10356/84920
http://hdl.handle.net/10220/4658
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Institution: Nanyang Technological University
Language: English
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spelling sg-ntu-dr.10356-849202020-03-07T13:57:21Z Determination of diffusion lengths with the use of EBIC from a diffused junction with any values of junction depths Ong, Vincent K. S. Kurniawan, Oka. School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering Minority carrier diffusion lengths determine the performance of bipolar and photodiode devices. An electron-beaminduced-current (EBIC) method has been widely used to extract this parameter. The extraction of the diffusion lengths involves a p-n junction to collect the minority carriers. The most used configuration, which is called the normal collector, assumes that the junction has an infinitely large junction depth. However, in planar devices, the junction depth is comparable to the diffusion lengths of the material. This paper presents a simple and yet accurate method to determine the diffusion lengths of the material from a diffused junction with any values of junction depths. The diffusion length of the material is extracted from the negative reciprocal of the slope of the EBIC profile in semi-logarithmic plot. It was found that the proposed method is able to extract the diffusion lengths accurately for any values of the junction depths and surface recombination velocities. The maximum error in using this method is about 6%. Published version 2009-06-23T04:15:36Z 2019-12-06T15:53:39Z 2009-06-23T04:15:36Z 2019-12-06T15:53:39Z 2006 2006 Journal Article Kurniawan, O., & Ong, V. K. S. (2006). Determination of diffusion lengths with the use of EBIC from a diffused junction with any values of junction depths. IEEE Transactions on Electron Devices, 53(9), 2358-2363. 0018-9383 https://hdl.handle.net/10356/84920 http://hdl.handle.net/10220/4658 10.1109/TED.2006.880837 en IEEE transactions on electron devices © 2006 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE. This material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder. http://www.ieee.org/portal/site. 6 p. application/pdf
institution Nanyang Technological University
building NTU Library
country Singapore
collection DR-NTU
language English
topic DRNTU::Engineering::Electrical and electronic engineering
spellingShingle DRNTU::Engineering::Electrical and electronic engineering
Ong, Vincent K. S.
Kurniawan, Oka.
Determination of diffusion lengths with the use of EBIC from a diffused junction with any values of junction depths
description Minority carrier diffusion lengths determine the performance of bipolar and photodiode devices. An electron-beaminduced-current (EBIC) method has been widely used to extract this parameter. The extraction of the diffusion lengths involves a p-n junction to collect the minority carriers. The most used configuration, which is called the normal collector, assumes that the junction has an infinitely large junction depth. However, in planar devices, the junction depth is comparable to the diffusion lengths of the material. This paper presents a simple and yet accurate method to determine the diffusion lengths of the material from a diffused junction with any values of junction depths. The diffusion length of the material is extracted from the negative reciprocal of the slope of the EBIC profile in semi-logarithmic plot. It was found that the proposed method is able to extract the diffusion lengths accurately for any values of the junction depths and surface recombination velocities. The maximum error in using this method is about 6%.
author2 School of Electrical and Electronic Engineering
author_facet School of Electrical and Electronic Engineering
Ong, Vincent K. S.
Kurniawan, Oka.
format Article
author Ong, Vincent K. S.
Kurniawan, Oka.
author_sort Ong, Vincent K. S.
title Determination of diffusion lengths with the use of EBIC from a diffused junction with any values of junction depths
title_short Determination of diffusion lengths with the use of EBIC from a diffused junction with any values of junction depths
title_full Determination of diffusion lengths with the use of EBIC from a diffused junction with any values of junction depths
title_fullStr Determination of diffusion lengths with the use of EBIC from a diffused junction with any values of junction depths
title_full_unstemmed Determination of diffusion lengths with the use of EBIC from a diffused junction with any values of junction depths
title_sort determination of diffusion lengths with the use of ebic from a diffused junction with any values of junction depths
publishDate 2009
url https://hdl.handle.net/10356/84920
http://hdl.handle.net/10220/4658
_version_ 1681040369690607616