Development of fixed abrasive chemical mechanical polishing process for glass disk substrates

• المؤلفون الرئيسيون: Tian, Ye Bing, Zhong, Zhao Wei, Lai, S. T., Ang, Y. J.
• مؤلفون آخرون: School of Mechanical and Aerospace Engineering
• التنسيق: مقال
• اللغة: English
• منشور في: 2016
• الموضوعات: Chemical mechanical polishing; Fixed abrasive polishing
• الوصول للمادة أونلاين: https://hdl.handle.net/10356/85029; http://hdl.handle.net/10220/40941

Glass disk substrates are used in a wide range of portable devices because of their relatively high resistance to heat and shocks compared to aluminum substrates. Chemical mechanical polishing (CMP) with fixed abrasive pad is an alternative glass disk substrates finishing method to loose abrasive la...