Development of fixed abrasive chemical mechanical polishing process for glass disk substrates

• Main Authors: Tian, Ye Bing, Zhong, Zhao Wei, Lai, S. T., Ang, Y. J.
• 其他作者: School of Mechanical and Aerospace Engineering
• 格式: Article
• 語言: English
• 出版: 2016
• 主題: Chemical mechanical polishing; Fixed abrasive polishing
• 在線閱讀: https://hdl.handle.net/10356/85029; http://hdl.handle.net/10220/40941

Glass disk substrates are used in a wide range of portable devices because of their relatively high resistance to heat and shocks compared to aluminum substrates. Chemical mechanical polishing (CMP) with fixed abrasive pad is an alternative glass disk substrates finishing method to loose abrasive la...