Photoluminescence study of ZnO films prepared by thermal oxidation of Zn metallic films in air

• Main Authors: Wang, Y. G., Lau, S. P., Lee, H. W., Yu, S. F., Tay, B. K., Zhang, X. H., Hng, H. H.
• Other Authors: School of Electrical and Electronic Engineering
• Format: Article
• Language: English
• Published: 2014
• Subjects: DRNTU::Science::Physics
• Online Access: https://hdl.handle.net/10356/90405; http://hdl.handle.net/10220/18818
• Institution: Nanyang Technological University

Zinc oxide (ZnO) films were synthesized by thermal oxidation of metallic zinc films in air. The influence of annealing temperatures ranging from 320 to 1000 °C on the structural and optical properties of ZnO films is investigated systematically using x-ray diffraction and room temperature photoluminescence (PL). The films show a polycrystalline hexagonal wurtzite structure without preferred orientation. Room temperature PL spectra of the ZnO films display two emission bands, predominant excitonic ultraviolet (UV) emission and weak deep level visible emission. It is observed that the ZnO film annealed at 410 °C exhibits the strongest UV emission intensity and narrowest full width at half maximum (81 meV) among the temperature ranges studied. The excellent UV emission from the film annealed at 410 °C is attributed to the good crystalline quality of the ZnO film and the low rate of formation of intrinsic defects at such low temperature. The visible emission consists of two components in the green and yellow range, and they show different temperature dependent behavior from UV emission. Their possible origins are discussed.