Extraction of diffusion length using junction-less EBIC

The electron-beam-induced current (EBIC) mode...

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Main Authors: Ong, Vincent K. S., Tan, Chee Chin., Radhakrishnan, K.
Other Authors: School of Electrical and Electronic Engineering
Format: Conference or Workshop Item
Language:English
Published: 2010
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Online Access:https://hdl.handle.net/10356/92076
http://hdl.handle.net/10220/6339
http://ieeexplore.ieee.org/search/freesrchabstract.jsp?tp=&arnumber=5403693&queryText%3DExtraction+of+Diffusion+Length+Using+Junction-less+EBIC%26openedRefinements%3D*%26searchField%3DSearch+All
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Institution: Nanyang Technological University
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spelling sg-ntu-dr.10356-920762019-12-06T18:16:58Z Extraction of diffusion length using junction-less EBIC Ong, Vincent K. S. Tan, Chee Chin. Radhakrishnan, K. School of Electrical and Electronic Engineering IEEE International Symposium on Integrated Circuits (12th : 2009 : Singapore) DRNTU::Engineering::Electrical and electronic engineering::Electronic systems::Signal processing The electron-beam-induced current (EBIC) mode of the scanning electron microscope (SEM) has been widely used in semiconductor materials and devices characterization in particular the extraction of minority carrier properties. The conventional approaches require the sample to have a built-in electric field created by the charge collecting junction that separates the majority carriers from the minority carriers and drives the induced current into the external circuitry for detection. As a result, these conventional approaches are not applicable for samples without junctions, i.e. bare substrates. This paper discusses the feasibility of extracting the minority carrier diffusion length in junction-less sample using the junction-less EBIC technique with the use of a two-point probe method. A 2-D device simulator is used to verify this technique and it is found the accuracy depends on the location of the origin. Published version 2010-08-20T08:21:46Z 2019-12-06T18:16:58Z 2010-08-20T08:21:46Z 2019-12-06T18:16:58Z 2009 2009 Conference Paper Ong, V. K. S., Tan, C. C., & Radhakrishnan, K. (2009). Extraction of diffusion length using junction-less EBIC. In proceedings of the 12th International Symposium on Integrated Circuits: Singapore, (pp.526-529). https://hdl.handle.net/10356/92076 http://hdl.handle.net/10220/6339 http://ieeexplore.ieee.org/search/freesrchabstract.jsp?tp=&arnumber=5403693&queryText%3DExtraction+of+Diffusion+Length+Using+Junction-less+EBIC%26openedRefinements%3D*%26searchField%3DSearch+All http://www.isic2009.org/ en © 2009 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE. This material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder. http://www.ieee.org/portal/site This material is presented to ensure timely dissemination of scholarly and technical work. Copyright and all rights therein are retained by authors or by other copyright holders. All persons copying this information are expected to adhere to the terms and constraints invoked by each author's copyright. In most cases, these works may not be reposted without the explicit permission of the copyright holder. 4 p. application/pdf
institution Nanyang Technological University
building NTU Library
country Singapore
collection DR-NTU
language English
topic DRNTU::Engineering::Electrical and electronic engineering::Electronic systems::Signal processing
spellingShingle DRNTU::Engineering::Electrical and electronic engineering::Electronic systems::Signal processing
Ong, Vincent K. S.
Tan, Chee Chin.
Radhakrishnan, K.
Extraction of diffusion length using junction-less EBIC
author2 School of Electrical and Electronic Engineering
author_facet School of Electrical and Electronic Engineering
Ong, Vincent K. S.
Tan, Chee Chin.
Radhakrishnan, K.
format Conference or Workshop Item
author Ong, Vincent K. S.
Tan, Chee Chin.
Radhakrishnan, K.
author_sort Ong, Vincent K. S.
title Extraction of diffusion length using junction-less EBIC
title_short Extraction of diffusion length using junction-less EBIC
title_full Extraction of diffusion length using junction-less EBIC
title_fullStr Extraction of diffusion length using junction-less EBIC
title_full_unstemmed Extraction of diffusion length using junction-less EBIC
title_sort extraction of diffusion length using junction-less ebic
publishDate 2010
url https://hdl.handle.net/10356/92076
http://hdl.handle.net/10220/6339
http://ieeexplore.ieee.org/search/freesrchabstract.jsp?tp=&arnumber=5403693&queryText%3DExtraction+of+Diffusion+Length+Using+Junction-less+EBIC%26openedRefinements%3D*%26searchField%3DSearch+All
http://www.isic2009.org/
_version_ 1681035436659572736
description The electron-beam-induced current (EBIC) mode of the scanning electron microscope (SEM) has been widely used in semiconductor materials and devices characterization in particular the extraction of minority carrier properties. The conventional approaches require the sample to have a built-in electric field created by the charge collecting junction that separates the majority carriers from the minority carriers and drives the induced current into the external circuitry for detection. As a result, these conventional approaches are not applicable for samples without junctions, i.e. bare substrates. This paper discusses the feasibility of extracting the minority carrier diffusion length in junction-less sample using the junction-less EBIC technique with the use of a two-point probe method. A 2-D device simulator is used to verify this technique and it is found the accuracy depends on the location of the origin.